Etude en Champ Proche des Limites de la Micro-fabrication Additive Electrochimiquement Assistée de Semi-Conducteurs Organiques sur Composants. // Near-Field Studying the Limits for Electrochemically-Assisted Additive Microfabrication of Organic Semiconduc
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ABG-136302
ADUM-71731 |
Sujet de Thèse | |
| 06/03/2026 | Contrat doctoral |
Université de Lille
Villeneuve d'Ascq - Les Hauts de France - France
Etude en Champ Proche des Limites de la Micro-fabrication Additive Electrochimiquement Assistée de Semi-Conducteurs Organiques sur Composants. // Near-Field Studying the Limits for Electrochemically-Assisted Additive Microfabrication of Organic Semiconduc
- Informatique
électrochimie, microscopie à sonde locale, nanocaractérisation
electrochemistry, scanning probe microscopy, nanocharacterisation
electrochemistry, scanning probe microscopy, nanocharacterisation
Description du sujet
Ce projet doctoral vise à comprendre comment utiliser l'électrochimie sur des microélectrodes pour « faire pousser » des semiconducteurs sur des puces en silicium, en utilisant différentes techniques de microscopie en champ proche pour en caractériser différentes propriétés de ces microstructures. Différents monomères seront formulés en solution et électrochimiquement déposés sur des puces préalablement lithographiées de microélectrodes. Différentes formulations et conditions d'électro-dépôt permettront de faire pousser différentes structures conductrices ou semi-conductrices à petite échelle. Par l'utilisation de différentes techniques de microscopie en champ proche : microscope à force atomique (AFM) pour la mesure de la topographie, AFM à pointe conductrice (c-AFM) pour la cartographie de courant, microscopie à sonde de Kelvin (KPFM) pour la mesure du potentiel de surface et AFM électrochimique (EC-AFM) pour le suivi des réactions électrochimique, nous pourront comprendre les phénomènes physicochimiques régissant la croissance de la matière à ces échelles. La compréhension des mécanismes régissant ces croissances doit nous amener à connaitre les limites de ce mode de dépôt pour son utilisation comme procédé de fabrication à part entière, pour la micro-fabrication à la demande de composant linéaires (résistance, condensateurs), non linéaires (diodes, transistors) ou de capteurs sur wafer.
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Additive manufacturing (3D printing) is a technological innovation which revolutionizes many sectors by its ability to build on demand, very rapidly and with minimal energy and material resources. However, there is no such equivalent for microelectronic fabrication : the conventional processes employed to structure matter on a silicon surface usually involve many cutting—edged equipments which consume a lot of water and energy to heat, cool, make vacuum, cut, implant or ionize. These conventional techniques are barely compatible with tomorrow's great societal challenge, and constrain the production of electronic chips in Europe with the Green Deal. By using electrochemistry to manufacture microelectronic devices, strategic semiconductors can be deposited on silicon chips : few volts and microcoulombs per device are enough to co-integrate conducting polymers in a near 100% yield with soft conditions, generating almost no waste and using non-toxic solvents (Moustiez et al 2025)*. The physical limits of this technology at such a small scale, its control in electrical and morphological properties, are however not very well understood yet.
This doctoral project aims at understanding how using electrochemistry on microelectrodes « to grow » semiconductors on a silicon chip, using different near-field microscope techniques to characterize the various properties of such microstructures. Diverse monomers will be formulated in solution and electrochemically deposited on lithographically patterned microelectrode chips. Different formulations and electrochemical parameters will promote different growths of semiconductors and conductors at small scale. By using different near-field microscope techniques : atomic force microscopy (AFM) to measure topography, conducting AFM (c-AFM) for conductance mapping, Kelvin probe microscopy (KPFM) for surface potential measurement and electrochemical AFM (EC-AFM) to monitor local electrochemical activities, we want to understand the many physical/chemical phenomena ruling material growth at such small scale. By understanding the nature of the mechanisms, we aim to identify the limits of this deposition technique to implement it as a fabrication process to microfabricate voltage linear devices (resistors, capacitors), non-linear devices (diodes, transistors), and sensors on a wafer.
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Début de la thèse : 01/10/2026
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Additive manufacturing (3D printing) is a technological innovation which revolutionizes many sectors by its ability to build on demand, very rapidly and with minimal energy and material resources. However, there is no such equivalent for microelectronic fabrication : the conventional processes employed to structure matter on a silicon surface usually involve many cutting—edged equipments which consume a lot of water and energy to heat, cool, make vacuum, cut, implant or ionize. These conventional techniques are barely compatible with tomorrow's great societal challenge, and constrain the production of electronic chips in Europe with the Green Deal. By using electrochemistry to manufacture microelectronic devices, strategic semiconductors can be deposited on silicon chips : few volts and microcoulombs per device are enough to co-integrate conducting polymers in a near 100% yield with soft conditions, generating almost no waste and using non-toxic solvents (Moustiez et al 2025)*. The physical limits of this technology at such a small scale, its control in electrical and morphological properties, are however not very well understood yet.
This doctoral project aims at understanding how using electrochemistry on microelectrodes « to grow » semiconductors on a silicon chip, using different near-field microscope techniques to characterize the various properties of such microstructures. Diverse monomers will be formulated in solution and electrochemically deposited on lithographically patterned microelectrode chips. Different formulations and electrochemical parameters will promote different growths of semiconductors and conductors at small scale. By using different near-field microscope techniques : atomic force microscopy (AFM) to measure topography, conducting AFM (c-AFM) for conductance mapping, Kelvin probe microscopy (KPFM) for surface potential measurement and electrochemical AFM (EC-AFM) to monitor local electrochemical activities, we want to understand the many physical/chemical phenomena ruling material growth at such small scale. By understanding the nature of the mechanisms, we aim to identify the limits of this deposition technique to implement it as a fabrication process to microfabricate voltage linear devices (resistors, capacitors), non-linear devices (diodes, transistors), and sensors on a wafer.
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Début de la thèse : 01/10/2026
Nature du financement
Contrat doctoral
Précisions sur le financement
Concours pour un contrat doctoral
Présentation établissement et labo d'accueil
Université de Lille
Etablissement délivrant le doctorat
Université de Lille
Ecole doctorale
632 ENGSYS Sciences de l'ingénierie et des systèmes
Profil du candidat
Ce sujet hautement expérimental se situe à l'interface entre les sciences physiques et l'électrochimie dans une équipe de recherche multi-disciplinaire. Le(la) candidat(e) au doctorat (niveau master ou diplômé ingénieur(e)) sera intégré(e) au groupe NCM de l'Institut d'Electronique, de Microélectronique et de Nanotechnologie (iemn.fr). Le(la) candidat(e) devra avoir un intérêt particulier pour les sciences interdisciplinaires et une curiosité à comprendre le contexte actuel et les enjeux sociétaux guidant la recherche de nouveaux matériaux pour la micro-électronique. Idéalement, un(e) scientifique avec une formation ou une expérience en microscopie champ proche et/ou en électrochimie sera requise pour mener à bien ces recherches.
This highly experimental topic lies at the interface between physics and electrochemistry in a multidisciplinary research team. A doctoral candidate (master level or graduated engineer) will integrate the NCM group at the Institute of Electronics, Microelectronics and Nanotechnology (iemn.fr). The candidate shall have a genuine interest for interdisciplinary sciences and curiosity to understand the current societal context driving material science researches for microelectronics manufacturing. Ideally, a scientist with a good training or experience in near-field microscopy and/or electrochemistry is required to carry out this research.
This highly experimental topic lies at the interface between physics and electrochemistry in a multidisciplinary research team. A doctoral candidate (master level or graduated engineer) will integrate the NCM group at the Institute of Electronics, Microelectronics and Nanotechnology (iemn.fr). The candidate shall have a genuine interest for interdisciplinary sciences and curiosity to understand the current societal context driving material science researches for microelectronics manufacturing. Ideally, a scientist with a good training or experience in near-field microscopy and/or electrochemistry is required to carry out this research.
11/05/2026
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